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论文期刊

论文标题    Stress and microstructure evolution in Al-induced crystallization of amorphous Ge thin films
作者    Zhang, WL; Ma, F; Zhang, TW; Xu, KW
发表/完成日期    2011-11-01
期刊名称    THIN SOLID FILMS
期卷    520(2)
相关文章   
论文简介    Stress evolution during Al-induced crystallization of amorphous Ge thin films was in-situ explored by multi-beam optical stress sensor (MOSS). The critical temperature at which crystallization occurs was determined by in-situ X-ray diffraction (XRD) measurement. In combination with microstructure characterization, we try to understand the mechanisms of stress generation as well as stress relaxation during metal induced crystallization (MIC).
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