论文期刊

Radio frequency magnetron sputtering of Au and low temperature plasma enhanced chemical vapor deposition of silicon nitride for ring ultramicroelectrodes fabrication




作者: 蒋庄德
发表/完成日期: 2006-09-07
期刊名称: Journal of Electroanalytical Chemistry
期卷: 596(2)
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论文简介
SCI:094CJ