| 论文简介 |
Plasma pattern transition in a symmetric hybrid structure cavity device at micrometer scale is researched through microplasma interaction in intervening microchannel between adjacent cavities while manipulating electric field strength. Plasma distribution reconfiguration in central (objective) cavity is observed when sidearm (donor) cavitiesareignited.Aslongascouplingeffectoccurredbymodulatingtheelectricfield strength in the sidearm cavities, stable plasma pattern transition in objective cavity is obtained,exhibitingplasmapatternsplitfromonecircularspot(initialpattern)totwo smallcircularspots(transitedpattern),alongwithplasmapeakemissionintensitydisplacementover100 µmtoitsequilibriumposition.Theshapeoftransitedplasmapatternsaredependingonthecouplingeffectfromsidearmcavities.Thetwocircularspots unsymmetrically distributed if either donor cavity is ignited, and the ratio of average emission intensity between the two plasma spots is over 30%, however, which is less than 4% if coupling symmetrically occurred. The electrical and optical properties of centralmicroplasmaarealsomodulated,thatthebreakthroughvoltageisdecreasedby 22%andemissionintensityisimprovedby∼30%,bymeansofplasmacoupling.The microplasmapatternformationatmicrometrescaleandmanipulationoftheelectrical properties in microscale cavity implies significant value in the application of plasma transistor and signal processing. |
(创新港)
