One‐Step Radical‐Intensified Selective Etching (RISE) Strategy for High‐Yield Synthesis of Monolayer MXene with Tailored Nanoholes
发布时间：2026-06-09
点击次数：
- 发布时间：
- 2026-06-09
- 论文名称：
- One‐Step Radical‐Intensified Selective Etching (RISE) Strategy for High‐Yield Synthesis of Monolayer MXene with Tailored Nanoholes
- 发表刊物：
- Angewandte Chemie International Edition, e4506784
- 通讯作者：
- Chenxu Liu, Hao Zhang, Anirban Sikdar, Kanglei Pang, Guangyuan Ma, Kai Xi, Shujiang Ding, Jiayin Yuan, Miao Zhang
- 是否译文：
- 否
- 发表时间：
- 2026-05-04