| Paper Name |
Thickness-Dependent Dielectric Screening in Few-Layer Phosphorus |
| Author |
Chengxiang Chen, Zhenyu Wang, Bo Zhang, Zixuan Zhang, Jinying Zhang, Yonghong Cheng, Kai Wu, Jun Zhou * |
| Publication/Completion Time |
2023-05-17 |
| Magazine Name |
Journal of Physical Chemistry Letters |
| Vol |
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| Related articles |
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| Paper description |
ABSTRACT：The dielectric screening plays a critical role in determining the fundamental electronic properties in semiconductor devices. In this work, we report a non-contact and spatially resolved method, based on Kelvin probe force microscopy (KPFM), to obtain the inherent dielectric screening of black phosphorus (BP) and violet phosphorus (VP) as a function of the thickness. Interestingly, the dielectric constant of VP and BP flakes increases monotonically and then saturates to the bulk value, which is consistent with our first-principles calculations. The dielectric screening in VP has a much weaker dependence on the number of layers. This could be ascribed to a strong electron orbital overlap between two adjacent layers of VP, resulting in a strong interlayer coupling. The findings of our work are significant both for fundamental studies of dielectric screening and for more technical applications in nanoelectronic devices based on layered 2D materials. |
(创新港)
