Name: Li Wang
Professional & technical post: Associate Professor
Final degree: PhD
Research direction: Surface Engineering, Micro/Nano manufacturing
E-mail: wanglime@mail.xjtu.edu.cn
Tel: +86-29－83399512
Fax: +86-29－83399512
English Version - 王 wanglime 莉
主持承担或作为项目骨干参加包括国家自然科学基金项目、国家科技重大专项、国家重点研发计划以及省部级项目等18项，其中共主持12项，包含军工2项，项目总经费千余万元。
发表学术论文60余篇，含SCI论文50篇，EI期刊论文6篇；以第一作者或通讯作者发表30余篇中科院2区以上论文，发表文章累计影响因子超过423，总他引数超过1226次。
申请发明专利46项，其中授权发明专利23项，软件著作权5项，国际PCT专利2项。其中，一种静电纺丝装置 ，一种防粘减阻纳米结构槽底连续快速曝光光固化打印机 配合国家增材制造研究院转化为产品纳米膏体3D打印机、底面弱黏附面曝光3D打印机，己实现成果转化。
多次参加国际特邀报告，并积极进行国际交流，在行业形成一定影响。
疫情初期通过3D打印柔弹性面罩助力抗疫。
Reviewer of the following journals:
1.Nano Energy（IF:17.7）
2.ACS nano（IF:12.881）
3.Carbon（IF:8.821）
4.ACS Applied materials& interfaces (IF:8.758)
5.Additive Manufacturing（IF:7.173）
6.Applied Surface Science（IF:6.182）
7.OPTICS LETTERS（IF:3.714）
8.IJAMT（international journal of advanced manufacturing technology）
The major scientific research experiences:
1.Nano- & micro- scale surface sciences and engineering
2.Micro- & nano- equipment and manufacturing technology
3.Precision machinery and Measurement technology
4.Additive Manufacturing（3D Printing）
The main projiect
1.Research on panchromatic 3D scanner and panchromatic continues SAL-3D printer；
2.Micro-nano sensors of composite structure based on the 3D printing technology；
3. Research and industrialization of high precision surface into 3D printing equipment ；
4.Research and development of large size surface exposure 3D printing equipment；
5.Research on active control method of local slip characteristics of bearing surface under variable load condition；
6.“Novel Preparation Technology of Pixel Matrix with Nano-structure Heterojunction in the Organic Light - Emitting Display” (Grant No.XA-AM-200804) supported by Xi'an Applied Materials Innovation Foundation；
7.“Study of Nano- & micro- Structures Substrate to Increase the OLED Extraction Efficiency” supported by the Key Laboratory for Advanced Displays and System Application Ministry of Education (Shanghai University) Open Project.。
Patents:
1.Wang Li; Ding Yucheng;Fan Fan; Chen Bangdao;Tian Hongmiao; A new manufacturing method of electron emission source nanoslit in Surface conduction electron emission display device [P]. CN200910022564.4. Xi'an Jiaotong University. Authorization date: 2010-06-02.
2.Wang Li; Ding Yucheng; Hao Xiuqing; He Zhongyun;Zong Xuewen; Lu Bingheng; A manufacturing method of a drag reduction surface[P]. CN200810232134.0. Authorization date: 2011-06-01
3.Wang Li; Ding Yucheng; Yuan Junwen; Luo Yu; He Zhongyun; Kuang Junsheng; A kind of OLED Manufacturing process with sub-micron structure[P]. CN201010286694.1. Authorization date: 2013-03-13
4.Wang Li; Ding Yucheng; Zhou Jie; Zong Xuewen;Wei Huifen; Lu Bingheng; A preparation method of convex grating marks using in imprint lithography alignment [P]. CN201010581347.1. Authorization date: 2012-09-05
5.Wang Li;Ding Yucheng; Zhou Ji;Wei Huifen; Lu Bingheng; A new method of increasing moiré image quality by digital moiré fringe using in lithography imprint alignment [P]. CN201010580993.6. Authorization date: 2013-01-02
The major publications:
1.Yu Luo,Shuyi Liu,Nilesh Barange,Li Wang*,Franky So.Perovskite Solar Cells on Corrugated Substrates with Enhanced Efficiency.Small,in press,DOI:10.1002/small.201601974(SCI:,IF:8.5);
2. Yu Luo, Li Wang*, Xiaonan Yang, Hui Duan, Wei Liu. Enhanced light extraction and tunable chromaticity in white organic light emitting devices with znonanopillars. Appied Optics Letters, 2016,3(7)（ SCI：， IF：3.2）
3.Xiuqing Hao , Guang Wu, Li Wang, Danhui Lv , Yu Luo , Liang Li , Ning He .Superhydrophobic surfaces based on ZnO-constructed hierarchical architectures.Microelectronic Engineering 141 (2015) 44–50（ SCI：， IF：1.277）;
4.Hao X, Pei S, Wang L*, et al. Microtexture fabrication on cylindrical metallic surfaces and its application to a rotor bearing system[J]. The International Journal of Advanced Manufacturing Technology, 2014: 1-9（ SCI：， IF：1.779）
5.Wang Li*, Wang Quandai, Yan Chengping, Duan Hui, Lv Danhui, Ding Yucheng.Experimental Research and Comparison on Tribological Properties of Bronze substrate with Different Surface Wettability，October 26-28,Chicago,STLE 2014[C]
6. Yu Luo, Li Wang*, Yucheng Ding, Long Li, Bin Wei, Jianhua Zhang. Flexible OLED with enhanced light outcoupling efficiency fabricated on doubleside nanotextured substrate. ACS Applied materials & interfaces[J] 2014, 6 (13),10213–10219 （ SCI IDS：AU6OF， IF：5.900）
7. Li XM ,Wang CH , Shao JY, Ding YC , Tian, HM, Wang, L. Periodic Parallel Array of Nanopillars and Nanoholes Resulting from Colloidal Stripes Patterned by Geometrically Confined Evaporative Self-Assembly for Unique Anisotropic Wetting,ACS APPLIED MATERIALS & INTERFACES[J] 2014,6(22) 20300-20308(SCI IDS: AU6OF IF=5.9)
8.Jiang CB , Li, XM, Tian, HM , Shao JY，Wang L . Lateral Flow through a Parallel Gap Driven by Surface Hydrophilicity and Liquid Edge Pinning for Creating Microlens Array,ACS APPLIED MATERIALS & INTERFACES 2014,6(21) 18450-18456 (SCI IDS: AU6OF IF:5.9)
9.Li XM ,Tian HM , Wang CH, Li X, Shao JY, Ding YC , Wang L.Electrowetting Assisted Air Detrapping in Transfer Micromolding for Difficult-to-Mold Microstructures,ACS APPLIED MATERIALS &
10.Yu Luo, Li Wang, Yucheng Ding, Long Li, High lightextracting efficiency for OLED
11.Traor Moussa Magara, Wang Li, Influences of the Flow Speed and the Micro-Texture Deepness on the Hydrodynamic Lubrication Characteristics, Journal of Computational and Theoretical Nanoscience, 10(2), pp 419-422, 2013/2.(SCI: 101BA)
12.Yu Luo,Li Wang*,Yucheng Dinga, Huifen Wei , Dongdong Wang, etal. Direct fabrication of microlens arrays with high numerical aperture by ink-jetting on nanotextured surface, Applied Surface Science, 2013 (279):36-40.(SCI: 101BA)
13.Wang Li*, Wang Quandai,Hao Xiuqing,etal.Finite element simulation and experimental study on the through-mask electrochemical micromachining (EMM ) process；International Journal of Advanced Manufacturing；2010 (51)1:155–162（SCI：666SX）
14.Xiuqing Hao, Li Wang*,Quandai Wang, Fangliang Guo, etal. Surface micro-texturing of metallic cylindrical surface with proximity rolling-exposure lithography and electrochemical micromachining, Applied Surface Science, Ｖ257（2011）, 8906-8911 (SCI: 789TR)
15.Li Wang*, Wei Xu, Yu Luo etal. Performances enhancement in OLEDs by inserting ultrathin trilayer in electron injection structure and using MoO3 as hole buffer layer,Displays,2011,(32)1:45-48(SCI:717VN)
16.Xiuqing Hao, Li Wang*,Yucheng Ding, etal. Finite Element Analysis of a maskless electrochemical strcturing(MECS) method, Adv. Sci. Lett., 2011, 4:1394-1398
17.Wang Li*, Wang Quandai, Hao Xiuqing, etal.Finite element simulation and experimental study on the through-mask electrochemical micromachining(EMM) process, International Journal of Advanced Manufacturing, 2010,(51)1:155–162(SCI:666SX)
18.Jinyou Shao, Yucheng Ding, Hongzhong Liu, Li Wang*, etal. Strategy for a loading force induced overlay position shift in step imprint lithography, Proc. IMechE, Part B: J. Engineering Manufacture,2009,1(223): 009-017(SCI:407MW)
19.Jinyou Shao, Hon gzhong Liu, Yucheng Ding,Li Wang*, etal. Alignment measurement method for imprint lithography using moiré fringe pattern, Optical Engineering, 2008, 11(47):113601(SCI:377RH)
20.Wang Li*, Lu B.H., Ding Y.C.,Qiu zhi-hui. etal. A Nano-scale Overlay Alignment Method for Imprint Lithograpy. Frontiers of Mechanical Engineering in China[J]. 2006, 1(2):157-161
21.Wang Li; Lu Bingheng; Ding Yucheng, etal. A Novel Two-Step Alignment Technique for Imprint Lithography, Acta Photonica Sinica, 2006, 35 (10):1608-1612
22.Wang Li*, Ding Y.C., Lu B.H., Li H.S. etal. Novel Nano-scale Overlay Alignment Method for Room-temperture Imprint Lithograpy. Semiconductor Photonics and Technology[J]. 2005, 11(42):275-288
23.Wang Li*, Lu B.H., Ding Y.C.,Qiu zhi-hui. etal. Novel nano-scale overlay alignment method for room-temperature imprint lithography. 2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies - Advanced Optical Manufacturing and Testing Technologies, Nov 2-5 2005, Xian, SPIE[C], 2006,6149, 61491V-1- 61491V-6(EI:05219118838)
24.Wang Li, Lu Bingheng, Ding Yucheng, Liu Hongzhong, Ultra-precision alignment based on differential moiré tetechnique, Chinese Journal of Mechanical Engineering [J]. 2005,41(4): 75-78(EI:05219118838)
25.Wang Li*,Lu Bingheng,Cui Dongyin, etal; Ultra-Precision Alignment for Room- Temperature Multi-Layer Imprint Lithography, , Journal of Xi'an Jiaotong University [J], 2004, 38(9):895-899(EI:04508717300)
26.Wang Li*, Ding Y.C., Lu B.H., Li H.S. etal. Novel Nano-scale Overlay Alignment Method for Room-temperture Imprint Lithograpy. Semiconductor Photonics and Technology[J]. 2005, 11(42):275-288
