One-step Radical-intensified Selective Etching (RISE) Strategy for High-yield Synthesis of Monolayer MXene with Tailored Nanoholes
- Release Time:2026-07-09
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Date:
2026-07-09Title of Paper:
One-step Radical-intensified Selective Etching (RISE) Strategy for High-yield Synthesis of Monolayer MXene with Tailored NanoholesJournal:
Angew. Chem. Int. EdCo-author:
Hao Zhang*, Anirban Sikdar, Kanglei Pang, Guangyuan Ma,Kai Xi, Shujiang Ding*, Jiayin Yuan,* Miao Zhang*First Author:
Chenxu LiuVolume:
65Issue:
25Translation or Not:
NoDate of Publication:
2026-01-01